etching process造句
例句與造句
- The resolution of an etching process is a measure of the fidelity of pattern transfer .
刻蝕工藝的分辨率是圖形轉(zhuǎn)移保真度的量度。 - Aluminium target with deep amplitude modulation fabricated by chemical wet etching process
調(diào)制靶的化學(xué)腐蝕制備工藝研究 - Studies on subsurface damage detection and wet - etching process of k9 optics
9基片的亞表面損傷探測(cè)及化學(xué)腐蝕處理技術(shù)研究 - Surface ramam spectrpscopy for in situ investigating silicon etching process
前驅(qū)體法制備氮氧化硅納米線及其光學(xué)性能研究 - In addition , the effect of collisions and a low source power can slow down the etching process
碰撞效應(yīng)和低電源功率減緩刻蝕的進(jìn)程。 - It's difficult to find etching process in a sentence. 用etching process造句挺難的
- John has been trying to develop a new etching process for months and he ' s finally struck oil
約翰已花了幾個(gè)月的時(shí)間來(lái)創(chuàng)造一種新的蝕刻工序，他最終獲得了成功。 - The lithographic and etching process for a membrane creates a mesh of metal wires with silicon dioxide filling the space between them
薄膜先以微影及蝕刻制程制作出金屬線路，線路之間則填入二氧化矽。 - The most competitive technologies of transferring solid membrane mainly include bond and etch process and smart cut process
最具競(jìng)爭(zhēng)力的轉(zhuǎn)移固體薄膜技術(shù)主要有鍵合加選擇性腐蝕工藝和注氫智能剝離工藝。 - To approach as a resist in dry etching processing , etching properties of the films in oxygen plasma have been investigated
為了探索該種薄膜在干刻蝕工藝過(guò)程中用作掩膜的可能性，還研究了它在氧離子體中的刻蝕性能。 - Plasma etching has been widely used in the etching process of si devices . now the study is focused on the microfabrication of compound semiconductor
等離子體干法刻蝕在硅器件的微細(xì)加工中已經(jīng)得到廣泛應(yīng)用，目前研究的焦點(diǎn)集中在化合物半導(dǎo)體。 - Observation on the variation of surface morphology during the etching process indicates that the grain boundary and te precipitates will be shown earlier than the dislocations
本文研究了晶片的腐蝕過(guò)程，觀察隨腐蝕程度的逐漸加深，晶片表面缺陷蝕坑形貌的變化。 - Via the experiment , the best etching process of etching insb - in material with chclfi plasma is confirmed . and the mechanism is also analyzed and discussed
通過(guò)實(shí)驗(yàn)確定該條件下chclf _ 2等離子體刻蝕insb - in的最佳工藝，并分析探討chclf _ 2等離子體刻蝕insb - in薄膜的機(jī)理。 - We discuss a low cost fabrication method of a diffractive microlens with high performance for both blue and red dvd objective lenses , which consists of single - step photolithography and a wet etching process
摘要采用單步光刻和濕法腐蝕工藝，低成本快速制作面向高性能藍(lán)光和紅光dvd光學(xué)頭物鏡的衍射微透鏡。 - For example , it is challenging for the chemical etching process to drop below a 1 . 5 aspect ratio while , with laser cutting and electroforming , apertures can be produced that have a 1 : 1 aspect ratio to the stencil thickness
比如，表觀比率低于1 . 5對(duì)于化學(xué)腐蝕試一大挑戰(zhàn)，而激光切割和電鑄可制成表觀比率為1 . 1的鋼網(wǎng)。 - Because the etched pattern will be effected by many factors , many technical difficulties such as getting the ideal etched pattern and monitoring the etching process have not been solved yet
因影響半導(dǎo)體激光誘導(dǎo)液相腐蝕效果的因素很多,要得到理想的腐蝕圖樣以及監(jiān)控腐蝕進(jìn)程有著很大的技術(shù)難度,至今沒(méi)有得到有效解決。
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